常晶晶：Spin Coating Epitaxial Films论文

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作者常晶晶（2019）在《Spin Coating Epitaxial Films》一文中研究指出：Epitaxy is usually used to produce high quality crystals with atomic perfection. Up to now,many semiconductor crystals of functional materials could be obtained by epitaxial growth techniques,such as molecular beam epitaxy,chemical vapor deposition,and liquid-phase epitaxy. However,these techniques are expensive,sophisticated,and not compatible with large area production. For solution-based deposition of epitaxial films such as hydrothermal processing[1],chemical bath deposition[2-3],and electrodeposition[4-5],specific conditions such as high temperature and pressure,or conducting substrates are commonly needed. Since single

Abstract

Epitaxy is usually used to produce high quality crystals with atomic perfection. Up to now,many semiconductor crystals of functional materials could be obtained by epitaxial growth techniques,such as molecular beam epitaxy,chemical vapor deposition,and liquid-phase epitaxy. However,these techniques are expensive,sophisticated,and not compatible with large area production. For solution-based deposition of epitaxial films such as hydrothermal processing[1],chemical bath deposition[2-3],and electrodeposition[4-5],specific conditions such as high temperature and pressure,or conducting substrates are commonly needed. Since single

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